Flexible Electronics News

Applied Materials Solves Major Bottleneck to Continued 2D Scaling

Selective Tungsten process technology gives chipmakers a new way to build transistor contacts.

Author Image

By: Anthony Locicero

Copy editor, New York Post

Applied Materials, Inc. introduced a technology that removes a critical bottleneck to continued 2D scaling in foundry-logic nodes.   Applied’s new Selective Tungsten process technology gives chipmakers a new way to build transistor contacts, which are the crucial, first level of wiring that connects the transistor to the rest of the wiring in the chip.   The selective deposition innovation lowers contact resistance which impedes transistor performance and increases power consumption. Wit...

Continue reading this story and get 24/7 access to Ink World magazine for FREE


Already a subscriber? Sign in

Keep Up With Our Content. Subscribe To Ink World magazine Newsletters